2 Inches Zirconium sputtering target Zr 99.9% with Grain Size ＜100μm
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our Zirconium Sputtering Target is available in various dimensions to meet the customer's demands and specifications. It has a diameter of 2 inches, making it easy to install and use in different sputtering systems. The target has a density of 6.51 g/cm3, which ensures its durab... Ver más
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6.51 G/cm3 Density Zirconium Sputtering Target for Precise Thin Film Deposition
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: This sputtering target has a melting point of 1855°C and a boiling point of 4409°C, making it a highly stable and durable material for use in high-temperature environments. Its fine grain size of less than 100μm ensures excellent sputtering performance and a high deposition rate... Ver más
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Thin Film Deposition Sputter Material Zirconium Target with Grain Size ＜100μm
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our Zirconium Sputtering Target meets the ASTM B 551,550 standards and is available in a range of grades, including Zr702, 705, 60001, 60901, 60804, and many others. This ensures that our product is of the highest quality and will meet the needs of our customers in a variety of ... Ver más
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6.51 G/cm3 Density Zirconium Sputtering Target for Precise Thin Film Deposition
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our Zirconium Sputtering Target has a surface roughness of less than 0.8μm, ensuring a smooth and even coating every time. The chemical composition of this product is Zr, with a minimum purity level of 99.5%. This guarantees that you are getting a high-quality product that will ... Ver más
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1855°C Melting Point Zr Min 99.5% Chemical Composition for B2B Industrial Products
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: With a surface roughness of less than 0.8μm and a density of 6.51 G/cm3, our Zirconium Sputtering Target ensures a smooth and consistent film deposition. Its fine grain size of less than 100μm guarantees a precise and uniform coating on your substrate. The Zirconium Sputtering T... Ver más
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ASTM B 551 Standard Zirconium Sputtering Target with Surface Roughness ＜0.8μm
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: One of the key features of this product is its high purity of 99.95%. This means that the Zirconium thin films deposited using this target have a high level of purity, which is essential for the performance of electronic devices. The purity of the target also ensures that the fi... Ver más
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Thin Film Deposition Zirconium Sputter Plate with High Boiling Point at 4409°C
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Zirconium is a highly durable and corrosion-resistant metal that has a melting point of 1855°C and a boiling point of 4409°C. This makes it an ideal material for use in high-temperature environments and applications that require high strength and excellent wear resistance. Our Z... Ver más
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Grade Zirconium Sputtering Target for Thin Film Deposition Standard 550 Grade 60001
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: This sputtering target is available in different grades, including Zr702, 705, 60001, 60901, 60804, and many more. Each grade has unique properties and characteristics that make it suitable for specific applications. Clients can choose the grade that best suits their project req... Ver más
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Surface Roughness 0.8μm Choose Sputtering Source Zirconium Target for Customer's Demands
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: With a melting point of 1855°C, the Zirconium sputtering target is capable of withstanding high temperatures and is ideal for use in a wide range of thin film deposition applications. The Zirconium Sputter Plate is also designed with a grain size of ＜100μm, which ensures a consi... Ver más
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2 Inches Diameter Zirconium Sputtering Target for Thin Film Applications
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: The Zirconium Sputtering Target has a diameter of 2 inches and a density of 6.51 g/cm3. It is manufactured in compliance with the ASTM B 551 and 550 standards, ensuring that the product meets the required quality and purity standards. The target is designed to provide consistent... Ver más
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High Purity Zirconium Sputter Target with Polished Surface
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: The Zirconium Sputter Disc has a density of 6.51 G/cm3, which makes it a highly durable and long-lasting product. It is available in various grades such as Zr702, 705, 60001, 60901, 60804, and more. The Zirconium Sputtering Target is widely used in industries such as aerospace, ... Ver más
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4409.C Purity High Purity Zirconium Sputtering Target Zirconium Sputter Disc For Thin Film Coating
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our High Purity Zirconium Sputtering Target is an essential product for various industrial applications, including the manufacture of semiconductors, flat panel displays, and solar panels. This sputtering source Zirconium target is a perfect choice for those who require a high-q... Ver más
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99.5% Pure Zirconium Targets with 0.8μm Surface Finish for Thin Film Coatings
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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Zirconium Sputtering Targets with Precision Coating for Meeting Customer Requirements
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: The Zirconium Sputter Plate is engineered to have a surface roughness of ＜0.8μm, which ensures a smooth and uniform thin film coating. This makes it an excellent choice for producing high-quality thin films for various applications. The Zirconium Sputtering Disc Target is highly... Ver más
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Polished Zirconium Sputtering Target for Silver Gray Coating with 99.95% Purity
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our Zirconium Sputtering Target conforms to the ASTM B 551 and 550 standards, ensuring high quality and reliability for your deposition processes. The silver-gray solid appearance of this target is highly desirable in the industry, and the polished surface ensures a smooth and e... Ver más
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99.95% Pure Zirconium Sputtering Targets Tailored to Your Specifications for Superior Coating Applications
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: Our Zirconium Sputtering Material Target has a boiling point of 4409°C, ensuring that it can withstand even the most extreme conditions. Its diameter measures 2 inches, perfect for use in a variety of sputtering systems. Its silver-gray solid appearance makes it easy to identify... Ver más
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Silver gray Solid Zirconium Target 2 with ＜0.8μm Surface Roughness (ASTM B 551 / 550)
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: This sputtering source Zirconium target is perfect for use in the production of thin films due to its exceptional properties. The Zirconium Thin Film Coating Target is known for its excellent thermal and electrical conductivity, combined with its high melting point, which makes ... Ver más
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Zirconium Sputtering Disc Target Zirconium Sputtering Material Target for High Temperature Coating
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: The Zirconium Thin Film Deposition Target has a diameter of 2 inches, making it an ideal size for use in a variety of deposition systems. Its surface is polished, ensuring that it is free from any surface imperfections that could affect its performance. The Zirconium Sputtering ... Ver más
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＜100μm Grain Size Silver gray Solid Zirconium Sputter Disc for Consistent Sputtering
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: The Zirconium Sputtering Material Target is highly valued for its superior surface roughness, which is less than 0.8μm. This level of precision ensures that the thin films deposited using this target are of high quality and have excellent adhesion properties. The target is desig... Ver más
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Zirconium Sputtering Target Suitable for Various Substrates and Applications
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Product Description: As a high purity Zirconium Sputtering Target, it is widely used in various applications such as semiconductor, optical, and thin film deposition industries. The polished surface of the target ensures a smooth and uniform coating, making it an ideal choice for sputtering applicat... Ver más
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