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China Customized Tungsten Sputtering Material Target with Melting Point of 3422°C en venta

Customized Tungsten Sputtering Material Target with Melting Point of 3422°C

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Tungsten sputtering target Thermal Conductivity 173 W/mK Round without coating en venta

Tungsten sputtering target Thermal Conductivity 173 W/mK Round without coating

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Melting Point 3422°C Tungsten Sputter Coating Target for Advanced Coating en venta

Melting Point 3422°C Tungsten Sputter Coating Target for Advanced Coating

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Customized Tungsten Sputtering Target with Indium Bonding and 7.5 Mohs Hardness en venta

Customized Tungsten Sputtering Target with Indium Bonding and 7.5 Mohs Hardness

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Customized Tungsten Thin Film Sputter Target with 19.3 G/cm3 Density en venta

Customized Tungsten Thin Film Sputter Target with 19.3 G/cm3 Density

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Indium Bonding Tungsten Sputtering Target for Thin Film Deposition Ra 0.8 μm en venta

Indium Bonding Tungsten Sputtering Target for Thin Film Deposition Ra 0.8 μm

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Tungsten Thin Film Deposition Target for Round Substrate Deposition Techniques en venta

Tungsten Thin Film Deposition Target for Round Substrate Deposition Techniques

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Ra 0.8 μm Tungsten Sputtering Target with Indium Bonding and 173 W/mK Thermal Conductivity en venta

Ra 0.8 μm Tungsten Sputtering Target with Indium Bonding and 173 W/mK Thermal Conductivity

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Round Tungsten Sputtering Target W 99.95% High Purity High Density Density 19.3 G/cm3 en venta

Round Tungsten Sputtering Target W 99.95% High Purity High Density Density 19.3 G/cm3

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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China Melting Point 3422°C Tungsten Sputtering Target for Advanced Thin Film Deposition en venta

Melting Point 3422°C Tungsten Sputtering Target for Advanced Thin Film Deposition

Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
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