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Blanco de la farfulla del metal
(30)Disco de titanio de 98x14 mm 97x16 mm ASTM F67 para dentadura postiza oral
Precio: $32.00 - $38.00/ Piece
MOQ: 1 Piece
El tiempo de entrega: 15~20 work days
Marca: CSTI
Destacar:ASTM F67 Titanium Disc, 98mm Titanium Disc, 97mm titanium discs
Titanium target is commonly used in the production of oral dentures, specifically for the manufacturing of implant-supported dentures. Titanium is a biocompatible material that is resistant to corrosion and has a high strength-to-weight ratio, making it an ideal material for dental implants. In the ... Ver más
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OEM PVD 5N+ 99,9995% Objetivos de titanio de alta pureza Objetivos de semiconductores películas finas
Precio: USD 60.0/pc - USD 180.0/pc
MOQ: 1 piece
El tiempo de entrega: 15-25 work days
Marca: Changsheng
OEM PVD 5N+ 99.9995% Titanium Targets High Purity Semiconductor Targets Thin Films We offer high purity Titanium targets for all major PVD systems. Titanium Targets can be made in purities ranging from 3N to 5N+. Through control of the target metallurgy, oxygen content, surface finish and assembly t... Ver más
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99.9%-99.999% Puridad Titanio Objetivos La clave para el éxito de la deposición de película delgada
Precio: USD 60.0/pc - USD 180.0/pc
MOQ: 1 piece
El tiempo de entrega: 15-25 work days
Marca: Changsheng
99.9%-99.999% Purity Titanium Targets The Key to Successful Thin Film Deposition We offer Titanium targets for all major PVD systems, and can be tailored for applications ranging from ultra-high performance to minimal-cost needs. Titanium Targets can be made in purities ranging from 3N to 5N+. Throu... Ver más
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Objetivo de pulverización de metal HIP unido con indio para diversos recubrimientos de película
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:HIP Metal Sputtering Target, Indium Bonded Metal Sputtering Target, Film Coatings Metal Sputtering Target
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99Pistola de recubrimiento de polvo electrostático redondo con acabado de superficie pulido.
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:HIP Round Electrostatic Powder Coating Gun, 99.99% Purity Electrostatic Powder Coating Gun,
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Objetivo de pulverización de metal de alta pureza unido con indio Compatible con varios sustratos
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Various Substrates Sputtering Target, Indium Bonded Metal Sputtering Target, High Purity Sputtering Target
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Máquinas de detección de metales de transporte circular pulido Pureza 99,99%
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Round Polished Conveyor Metal Detector Machines, 99.99% Purity Conveyor Metal Detector Machines,
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Detector de metales de caída libre para superficies pulidas
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Customized Round Hot Melt Glue Gun, Freefall Metal Detector, Polished Surfaces Hot Melt Glue Gun
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Objetivos de pulverización de alta pureza para la deposición de películas finas con control preciso
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Thin Film Deposition Sputtering Targets, Precise Control Sputtering Targets, High Purity Sputtering Targets
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Objetivos de pulverización de pureza única/múltiples personalizados con superficie pulida
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Customized Sputtering Targets, Multiple Purity Sputtering Targets, Polished Surface Sputtering Targets
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99.99% de pureza Metales de pulverización de blanco con la estructura de cristal de la superficie pulida
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Crystal Structure Metal Sputtering Target, Polished Surface Metal Sputtering Target, 99.99% Purity Metal Sputtering Target
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Objetivo metálico personalizado para recubrimientos de pulverización de configuración única o múltiple Ra 0,8 Um
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Single Configuration Metal Sputtering Target, Multiple Configuration Metal Sputtering Target, Customized Metal Sputtering Target
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Objetivo de pulverización de aleación de indio con sustratos personalizados pulidos y anodizados
Precio: Negotiable
MOQ: Negotiable
El tiempo de entrega: Negotiable
Destacar:Customized Substrates Sputtering Target, Polished Sputtering Target, Anodized Sputtering Target
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99.995% de pureza Titanio Sputtering objetivo PVD revestimiento de objetivos de tubo rotativo
Precio: USD 100.0/pc - USD 180.0/pc
MOQ: 1 piece
El tiempo de entrega: 15-25 work days
Marca: Changsheng
99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so ... Ver más
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Objetivo de pulverización de metal Ti Ti-Al Zr Cr para revestimiento PVD 100*40 mm de venta en caliente
Precio: USD24/pc
MOQ: 200pcs
El tiempo de entrega: 15~20 work days
Marca: Changsheng
Destacar:PVD Coating Metal Sputtering Target, 100*40mm Metal Sputtering Target,
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Ver más
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Bloque del grado 23 de la blanco del titanio Gr5-Eli para el implante dental ASTM F136
Precio: 35usd/kg
MOQ: 10pc
El tiempo de entrega: 10-15days
Marca: Changsheng
Destacar:Gr23 Titanium Target Block, Dental Implant Titanium Target Block, ASTM F136 Target Block
DescriptionTitanium Gr5-Eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI)Titanium Gr5-Eli Target is a titanium alloy that is composed of 6 % aluminum, 4 % vanadium, and extra low interstitial elements (ELI).Titanium Gr23 Targe... Ver más
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Objetivo de pulverización de titanio Ti para revestimiento Ti Ti-Al Zr Cr para revestimiento PVD
Precio: 23usd/pc
MOQ: 50pcs
El tiempo de entrega: 10-15days
Marca: Changsheng
Destacar:Polished Titanium Sputtering Target, Plating Titanium Sputtering Target, Titanium Metal Sputtering Target
Description Titanium Sputtering Target, Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, Titanium is lustrous and silvery-white in appearance. Titanium has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor press... Ver más
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Forma de la placa objetivo de pulverización de cromo de alta pureza para la máquina de recubrimiento PVD
Precio: USD24/pc
MOQ: 200pcs
El tiempo de entrega: 15~20 work days
Marca: Changsheng
Destacar:High Purity Chromium Sputtering Target Plate, High Purity Target Plate, PVD Coating Machine Target Plate
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Ver más
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Precio de fábrica personalizado Objetivos de titanio 100*40mm 100*45mm,95*45mm Revestimiento
Precio: USD24/pc
MOQ: 200pcs
El tiempo de entrega: 15~20 work days
Marca: Changsheng
Destacar:Factory Price Customized titanium targets, Coating Titanium Targets,
Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities and shapes, by combining our technologies of melti... Ver más
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Titanio SS 304 PVD Revestimiento de pulverización Objetivos 100 * 40mm 95 * 45mm 98 * 10mm para la industria
Precio: USD24/pc
MOQ: 100pcs
El tiempo de entrega: 15~20 work days
Marca: Changsheng
Destacar:Titanium Sputtering Targets, PVD Coating Sputtering Targets, SS 304 Sputtering Targets
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Ver más
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